Tantalum(V) ethoxide, packaged for use in deposition systems

Code: 760404-25G D2-231

Application

Tantalum(V) ethoxide precursor is used to deposit ultra thin films of Tantalum oxide and other tantalum containing films by atomic layer deposition and chemical v...


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£722.74 inc. VAT
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Application

Tantalum(V) ethoxide precursor is used to deposit ultra thin films of Tantalum oxide and other tantalum containing films by atomic layer deposition and chemical vapor deposition methods

Packaging

25 g in stainless steel cylinder

bp155 °C/0.01 mmHg (lit.)
density1.566 g/mL at 25 °C (lit.)
formliquid
InChI keyHSXKFDGTKKAEHL-UHFFFAOYSA-N
InChI1S/5C2H5O.Ta/c5*1-2-3;/h5*2H2,1H3;/q5*-1;+5
mp21 °C (lit.)
refractive indexn20/D 1.487 (lit.)
SMILES stringCCO[Ta](OCC)(OCC)(OCC)OCC
Cas Number6074-84-6
Hazard Class8
Un Number2920
Pack Group2
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