Application
Precursors Packaged for Depositions Systems
The product is a precursor for the deposition of titanium dioxide thin films by atomic layer deposition with water. Tetrakis(dimethylamido)titanium(IV) (TDMAT) undergoes exothermal reaction with excess cyclopentadiene to yield tris(dimethylamido)(η5-cyclopentadienyl)titanium(IV).
General description
Atomic number of base material: 22 Titanium
Packaging
25 g in stainless steel cylinder
This product has met the following criteria: