Tris(tert-butoxy)silanol, 100.00%

Code: 553468-25G D2-231

Application

Tris(tert-alkoxy)silanols reacts with tetrakis(dimethylamino)-hafnium vapor(Hf(N(CH3)2)4) for vapor phase deposition of hafnium s...


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£308.00 25G
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Application

Tris(tert-alkoxy)silanols reacts with tetrakis(dimethylamino)-hafnium vapor(Hf(N(CH3)2)4) for vapor phase deposition of hafnium silicate glass films. Tris(tert-butoxy)silanol is used for atomic layer deposition (ALD) of highly conformal layers of amorphous silicon dioxide and aluminum oxide nanolaminates.

General description

Tris(tert-butoxy)silanol can react with various metal alkyl amides to act as precursors for vapor deposition metal silicates. It also acts as a suitable precursor for deposition of silica.

Packaging

5, 25 g in glass bottle

assay99.999%
bp205-210 °C (lit.)
formsolid
InChI keyHLDBBQREZCVBMA-UHFFFAOYSA-N
InChI1S/C12H28O4Si/c1-10(2,3)14-17(13,15-11(4,5)6)16-12(7,8)9/h13H,1-9H3
mp63-65 °C (lit.)
Quality Level100
SMILES stringCC(C)(C)O[Si](O)(OC(C)(C)C)OC(C)(C)C
Code
Description
Unit Size
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553468-5G
Tris(tert-butoxy)silanol, 100.00%

Unit:5G
List Price: £91.10
Source:List Price
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Cas Number18166-43-3
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