Tris(dimethylamido)aluminum(III),

Code: 469947-10G D2-231

Application

Tris(dimethylamido)aluminum(III) may be used as a precursor to aluminum nitride (AlN) thin films by organometallic chemical vapor deposition (OMCVD).


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£585.00 10G
£702.00 inc. VAT
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Application

Tris(dimethylamido)aluminum(III) may be used as a precursor to aluminum nitride (AlN) thin films by organometallic chemical vapor deposition (OMCVD).

General description

Atomic number of base material: 13 Aluminum

Packaging

10 g in glass bottle

density0.865 g/mL at 25 °C (lit.)
formsolid
InChI keyJGZUJELGSMSOID-UHFFFAOYSA-N
InChI1S/6C2H6N.2Al/c6*1-3-2;;/h6*1-2H3;;/q6*-1;2*+3
mp82-84 °C (lit.)
Quality Level100
reaction suitabilitycore: aluminum
SMILES stringCN(C)[Al](N(C)C)N(C)C.CN(C)[Al](N(C)C)N(C)C
Cas Number32093-39-3
Hazard Class4.3
Un Number3131
Pack Group1
This product has met the following criteria: