Ceramic Etchant A,

Code: 667447-500ML D2-231

Application

Useful for fast and controllable etching of silicon nitride (Si₃N₄), galium nitride (GaN), or aluminum oxide (Al₂O₃).<...

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£142.00 500ML

£170.40 inc. VAT

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Application

Useful for fast and controllable etching of silicon nitride (Si₃N₄), galium nitride (GaN), or aluminum oxide (Al₂O₃).

Features and Benefits

Etch Rates @ 180 °C:Aluminum oxide 120 Å/min Silicon nitride 125 Å/min Gallium nitride 80 Å/min Silicon dioxide 1 Å/min Silicon 1 Å/min

Packaging

500 mL in glass bottle

Quality Level

100

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