Gold coated silicon wafer; , 99.999% (Au), layer thickness 1000 Ang., 99.99% (Ti)

Code: 643262-1EA D2-231

Application

Gold coated silicon wafers may be used in soft lithography for micro and nanoscale patterning.

General description

Our gold-coated si...


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Your Price
£397.00 EACH
£476.40 inc. VAT

Application

Gold coated silicon wafers may be used in soft lithography for micro and nanoscale patterning.

General description

Our gold-coated silicon wafers use electron-beam lithography to form amorphous layers (50Å of titanium followed by 1000Å of gold) on top of the silicon wafer.

The product is highly crystalline, with ﹤111> orientation gold and ﹤100> orientation silicon wafer is used. Titanium is used as an adhesion layer to bind gold to the silicon wafer.

Packaging

Packaging 1 set in single wafer shipper

1 ea in padded box

assay99.999% (Au), 99.99% (Ti)
diam. × thickness4 in. × 500 µm
InChI keyPCHJSUWPFVWCPO-UHFFFAOYSA-N
InChI1S/Au
layer thickness1000 Å
matrix attachmentTitanium, as adhesion layer used to bind the gold to the silicon wafer.
Quality Level100
SMILES string[Au]
Cas Number7440-57-5
This product has met the following criteria: